Artist In Residence 2026 - Rijksmuseum (Due Aug. 24)
Artist In Residence 2026 - Rijksmuseum
Deadline: August 24th, 2025
In 2026, the Rijksmuseum will once again host its annual Artist in Residence programme, inviting one artist to participate. It also offers opportunities for artistic research, experimentation and the making of new work. Both Dutch artists and non-Dutch artists who are well-embedded in the Dutch art world are eligible to apply for this residency.
Artist in Residence Programme
If you are the successful candidate you will have access to our collections, library, archive, laboratories and expertise. You will also have the opportunity to join workshops and excursions to foster exchanges of knowledge.
The Rijksmuseum invites outstanding candidates to submit a proposal for an artistic project, preferably one that is research-based and that reflects on, responds to, and interacts with the Rijksmuseum’s collections or its history, activities and function as an institution. We expect from the selected artist that they create an artwork or artistic intervention for presentation in the museum.
Research and artistic process
We welcome independent proposals that offer new perspectives on the Rijksmuseum’s collections, history and activities, and that perform research on them. As the successful candidate you will be free to work according to your own artistic process and method. There are no restrictions on your artwork in terms of its genre, medium, subject or format, provided that the work you produce does not conflict with our policies and ethical principles, or compromise the safety of the collections, building, visitors and/or staff.
The Artist in Residence programme offers the selected artist the opportunity to conduct some of their artistic activities within the Rijksmuseum itself, and encourages them to connect with the Rijksmuseum Fellowship research programme. For this reason, we are particularly keen to receive applications from talented artists for whom research is an essential part of their practice.